Besch Style - Flux.2 Klein-9B Base LoKR - V02 Showcase
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Base Model vs LoKR (Step 15000)
Side-by-side comparison between the original Klein-9B base model and BESCH LoKR at step 15000.
On the left: base model output — flatter lighting, simpler shadow segmentation, less controlled edge contrast.
On the right: trained adapter — stronger graphic silhouette separation, bold ink outlines, angular shadow planes, neon rim lighting and deeper color contrast.
This comparison highlights how BESCH enhances graphic structure, lighting intensity and stylistic cohesion while preserving the original composition.